Notice ID: 0a45eaa1eade41778a0a750f86e7505cAward NoticeAwardedArchived
Primary S-Parameter Standards for Plasma Etching Record
Awarded on May 5, 2026. The description is published on SAM.gov: Full description on SAM.gov.
Awarded tounder 1333ND26PNB030117 (source: SAM.gov award notice)• $98.0K
Overview
- Posted
- October 7, 2026
- Notice type
- Award Notice
- NAICS
- 334516: Analytical Laboratory Instrument Manufacturing
- Agency
- Department of CommerceNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
Notice details
- Office
- DEPT OF COMMERCE NIST
- Place of performance
- Gaithersburg, Maryland, 20899
- PSC
- 6640: LABORATORY EQUIPMENT AND SUPPLIES
- Last updated
- Oct 28, 2026
- First published
- Last updated on SAM.gov
- Award date
- May 5, 2026
- Award amount (SAM.gov award notice)
- $98.0K
Identifiers
- Solicitation number
- 1333ND26QNB030097
- Notice ID
- 0a45eaa1eade41778a0a750f86e7505c
- Award number (PIID)
- 1333ND26PNB030117
Description
No description in the SAM.gov data feed for this notice.
Award Overview
Award Number
1333ND26PNB030117
Award Amount (SAM.gov award notice)
$98.0K
Award Date
May 5, 2026
Awardee
Awardee UEI
SMFHE5KKART8
Awardee CAGE Code
4MUZ6
Awardee Address
Duluth, GA 30096, UNITED STATES
Original Solicitation
Notice ID: 0a45eaa1eade41778a0a750f86e7505c
Posted Date: Oct 7, 2026
Original Response Deadline: Not specified
Contacts
Contracting Officer
Primary Contact
Ranae M. Armstrong
Secondary Contact
Donald Collie
Documents
Select documents to download
Showing 4 of 4 items
Document | Source | Agency | Posted Date | File Size | Actions | |
|---|---|---|---|---|---|---|
| Combined Synopsis/Solicitation | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY | Oct 7, 2026 | 45.41 KB | |||
| Combined Synopsis/Solicitation | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY | Oct 7, 2026 | 49.67 KB | |||
| Combined Synopsis/Solicitation | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY | Oct 7, 2026 | 50.57 KB | |||
| Combined Synopsis/Solicitation | NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY | Oct 7, 2026 | 201.87 KB |
Lifecycle
- 3Version 3Combined Synopsis/SolicitationArchived
Primary S-Parameter Standards for Plasma Etching Record
- 4Version 4Award NoticeArchived
Type changed from Combined Synopsis/Solicitation to Award Notice
Primary S-Parameter Standards for Plasma Etching Record
- 8Version 8Award NoticeArchivedCurrent
Primary S-Parameter Standards for Plasma Etching Record
Similar Opportunities
Additional Details
Solicitation Number
1333ND26QNB030097
Archive Date
Oct 17, 2026
Office Address
GAITHERSBURG, MD, 20899