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Notice ID: 0a45eaa1eade41778a0a750f86e7505cAward NoticeAwarded

Primary S-Parameter Standards for Plasma Etching Record

Awarded on May 5, 2026. The description is published on SAM.gov: Full description on SAM.gov.

Awarded tounder 1333ND26PNB030117 (source: SAM.gov award notice)• $98.0K

Description

No description in the SAM.gov data feed for this notice.

Full description on SAM.gov

Overview

Agency:
Department of CommerceNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY
Office:DEPT OF COMMERCE NIST
Posted:October 7, 2026
NAICS:334516: Analytical Laboratory Instrument Manufacturing
Last Updated:Oct 23, 2026
First published:
Last updated on SAM.gov:
PSC:6640: LABORATORY EQUIPMENT AND SUPPLIES
Set-Aside:Not specified
Type:Award Notice
Place of Performance:Gaithersburg, Maryland, 20899
Award Date:May 5, 2026
Award Amount (SAM.gov award notice):$98.0K

Award Overview

Award Number

1333ND26PNB030117

Award Amount (SAM.gov award notice)

$98.0K

Award Date

May 5, 2026

Awardee

Awardee UEI

SMFHE5KKART8

Awardee CAGE Code

4MUZ6

Awardee Address

Duluth, GA 30096, UNITED STATES

Original Solicitation

Notice ID: 0a45eaa1eade41778a0a750f86e7505c

Posted Date: Oct 7, 2026

Original Response Deadline: Not specified

Contacts

Contracting Officer

Primary Contact

Ranae M. Armstrong

Secondary Contact

Documents

Select documents to download

Showing 4 of 4 items

Document
Source
Agency
Posted Date
File Size
Actions
Combined Synopsis/SolicitationNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYOct 7, 202645.41 KB
Combined Synopsis/SolicitationNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYOct 7, 202649.67 KB
Combined Synopsis/SolicitationNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYOct 7, 202650.57 KB
Combined Synopsis/SolicitationNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGYOct 7, 2026201.87 KB

Lifecycle

  1. 3
    Version 3Combined Synopsis/SolicitationArchived

    Primary S-Parameter Standards for Plasma Etching Record

    Notice ecbfd389e1e2494992136ec3ffcc8e5f on SAM.gov

  2. 4
    Version 4Award NoticeArchived

    Type changed from Combined Synopsis/Solicitation to Award Notice

    Primary S-Parameter Standards for Plasma Etching Record

    Notice 514a2881c09645c59d04cac3651fd9dc on SAM.gov

  3. 8
    Version 8Award NoticeArchivedCurrent

    Primary S-Parameter Standards for Plasma Etching Record

    Notice 0a45eaa1eade41778a0a750f86e7505c on SAM.gov

Similar Opportunities

Title
Phase
Agency
NAICS
Set Aside
Posted
Deadline
Location

Additional Details

Solicitation Number

1333ND26QNB030097

Archive Date

Oct 17, 2026

Office Address

GAITHERSBURG, MD, 20899