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Notice ID: 79be3c4d1c304e9d85edc714d43d4799SolicitationArchived

Atomic Layer Deposition (ALD) Batch Reactor

Archived on September 16, 2026. Original response deadline: . Full description on SAM.gov.

Overview

Response deadline
9:00 AM EDT
Posted
August 25, 2026
Notice type
Solicitation
NAICS
333242: Semiconductor Machinery Manufacturing
Agency
Department of CommerceNATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY

Notice details

Office
DEPT OF COMMERCE NIST
Place of performance
Gaithersburg, Maryland, 20878
PSC
5961: SEMICONDUCTOR DEVICES AND ASSOCIATED HARDWARE
Last updated
Oct 28, 2026
First published
Last updated on SAM.gov

Identifiers

Solicitation number
1333ND26QNB030533
Notice ID
79be3c4d1c304e9d85edc714d43d4799

Description

AMENDMENT 1: The purpose of this amendment is to provide a list of timely submitted vendor questions along with the Government's responses. Please see below:

1. Question: Please identify the facility interfaces available for the existing dry vacuum pump, pump exhaust, ozone destruct system and vented precursor cabinet, including applicable connection types and their approximate distance from the intended tool location. Please also identify whether chilled water or any utility not listed in the Statement of Requirements will be available or required. 

Response: To clarify, as the requirements indicate, only a vacuum pump is provided by NIST. The inlet is NW40 and the pump outlet is either NW25 or NW40 depending upon the pump used. If the tool pump port is smaller than NW40, NIST can use a reducer to use one of its existing pumps. Ozone destruct and vented precursor cabinet are the contractor's responsibility and can have any external duct connection that is suitable for interfacing with common flexible duct hoses. We typically use hoses with inner diameters of 2.5" or 3.0" to connect to house exhaust. The distances between utilities and the tool location are on the order of 36". NIST will run gas and exhaust lines from the tool to the utility connection points. Per the requirements, utility requirements should be limited to power, compressed air, and carrier gas. Chilled water is not readily available.

2. Question: Please clarify the required delivery handoff point. Does FOB Destination delivery end at NIST Shipping and Receiving, or must the contractor also provide uncrating, rigging, cleanroom wipe-down, and final placement?

Response: FOB destination at NIST shipping and receiving is sufficient.

3. Question: Please confirm whether NIST or the contractor is responsible for furnishing the ALD and SAM precursors required for commissioning and acceptance testing. If the contractor is responsible, please identify the required chemicals, quantities and purity grades.

Response: NIST will furnish the precursors required for commissioning and acceptance testing.

4. Question: Please confirm whether NIST will perform the listed acceptance tests and associated metrology using Government personnel and equipment, or whether the contractor must provide OEM personnel, process qualification, metrology and a separate qualification data package. If contractor or OEM support is required, please identify the expected on-site scope, required deliverables and acceptance criteria.

Response: NIST will perform acceptance tests and metrology using government personnel and equipment.

5. Question: The solicitation requires a warranty but does not specify its duration or service requirements. Please confirm the minimum warranty period, warranty start date and whether on-site warranty service or a specific response time is required.

Response: Warranty period is specified in the requirements document as a minimum of one year after acceptance.

6. Question: The system is identified as an ALD batch reactor, but the solicitation does not specify a minimum batch capacity. Would a system capable of processing a single 200 mm wafer, as well as smaller substrate pieces, satisfy this requirement, or must the system accommodate multiple wafers simultaneously? If multiple-wafer processing is required or preferred, please identify the minimum desired batch capacity.

Response: Yes, a system capable of processing a single 200 mm wafer and smaller pieces would satisfy requirements.

7. Question: The technical specifications require five single-port precursor sources, including one source valve dedicated to ozone, as well as four independently heated 50 mL precursor cylinders. Please confirm whether the system must support all four precursor cylinders and the dedicated ozone source simultaneously without reconfiguring or exchanging source connections.

Response: The system must support all four precursor sources and ozone simultaneously.

8. Question: The solicitation states that the system must be end-user installable, with assembly limited to connecting the compressed-air supply, nitrogen supply, electrical power and reactant sources. Please confirm that NIST will provide the required facility utilities at or immediately adjacent to the intended tool location and that the contractor is not responsible for extending, rerouting or orbitally welding facility gas lines. 

Response: NIST will provide facility utilities close to the intended tool location and NIST will make the connections to the tool. Contractor is not responsible for welding or making the external connections.

** Due date for quote submission has not changed. All quotes must be received no later than 9:00AM EST on 9/1/2026.**

END OF AMENDMENT 1. 

________________________________________________________

Please see attached Form SF1449.

Full description on SAM.gov

Award Overview

Contacts

Contracting Officer

Primary Contact

Documents

Files (1)

  • FormSF1449.pdf

    1.5 MBAdded in Solicitation version 4Posted
    Download

Lifecycle

  1. 3
    Version 3Sources SoughtArchived

    Atomic Layer Deposition (ALD) Batch Reactor

    Notice 93e6be5681784626bc7947efa14cd2fa on SAM.gov

  2. 4
    Version 4SolicitationArchived

    Type changed from Sources Sought to Solicitation

    Atomic Layer Deposition (ALD) Batch Reactor

    Notice ef626f9911f34bffb644c497aafe3d4e on SAM.gov

  3. 6
    Version 6SolicitationArchivedCurrent

    Atomic Layer Deposition (ALD) Batch Reactor

    Notice 79be3c4d1c304e9d85edc714d43d4799 on SAM.gov

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Additional Details

Solicitation Number

1333ND26QNB030533

Archive Date

Sep 16, 2026

Office Address

GAITHERSBURG, MD, 20899